Open air plasma chemical vapor deposition of highly dielectric amorphous TiO2 filmsHyunKwon Ha, Mamoru Yoshimoto, Hideomi Koinuma, BumKi Moon, and Hiroshi IshiwaraCitation: Appl. Phys. Lett. 68, 2965 (1996); doi: 10.1063/1.116370View online: http://dx.doi.org/10.1063/1.116370View Table of Contents: http://apl.aip.org/resource/1/APPLAB/v68/i21Published by the AIP Publishing LLC.Additional information on Appl. Phys. Lett.Journal Homepage: http://apl.aip.org/Journal Information: http://apl.aip.org/about/about_the_journalTop downloads: http://apl.aip.org/features/most_downloadedInformation for Authors: http://apl.aip.org/authorsDownloaded 25 Sep 2013 to 158.132.169.172. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: http://apl.aip.org/about/rights_and_permissions
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